Technology Solutions: Capturing mercury with ultraviolet light

نویسندگان

چکیده

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Protective Action in Irradiation of Amylase Solutions with Ultraviolet Light

Evidence has been presented which indicates that the protective action of dogs' sera in irradiation of pancreatin solutions with ultraviolet light is the result of a competitive absorption (screening action). A similar effect is found in simple pancreatin solutions for which we may account (at least to a first approximation) on the basis of assumed homogeneous absorption by a strong competitor ...

متن کامل

Capturing and Rendering with Incident Light Fields

This paper presents a process for capturing spatially and directionally varying illumination from a real-world scene and using this lighting to illuminate computer-generated objects. We use two devices for capturing such illumination. In the first we photograph an array of mirrored spheres in high dynamic range to capture the spatially varying illumination. In the second, we obtain higher resol...

متن کامل

Ultraviolet Light

Ultraviolet light (UV) is a recognized disinfection alternative to chlorine and ozone in many applications from drinking water to wastewater treatment. UV provides effective disinfection without production of problematic disinfection byproducts. Information on the mechanism and application of UV for drinking water disinfection is presented. Advantages and disadvantages of the technique are disc...

متن کامل

Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond.

All nanofabrication methods come with an intrinsic resolution limit, set by their governing physical principles and instrumentation. In the case of extreme ultraviolet (EUV) lithography at 13.5 nm wavelength, this limit is set by light diffraction and is ≈3.5 nm. In the semiconductor industry, the feasibility of reaching this limit is not only a key factor for the current developments in lithog...

متن کامل

Extreme ultraviolet interference lithography with incoherent light

In order to address the crucial problem of high-resolution low line-edge roughness resist for extreme ultraviolet (EUV) lithography, researchers require significant levels of access to high-resolution EUV exposure tools. The prohibitively high cost of such tools, even microfield tools, has greatly limited this availability and arguably hindered progress in the area of EUV resists. To address th...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Environmental Science & Technology

سال: 2004

ISSN: 0013-936X,1520-5851

DOI: 10.1021/es0404872